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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Reliable fluorinated thin gate oxides prepared by liquid phase deposition following rapid thermal process
Details
Reliable fluorinated thin gate oxides prepared by liquid phase deposition following rapid thermal process
Journal
IEEE Electron Device Letters
Journal Volume
17
Journal Issue
4
Pages
172-174
Date Issued
1996
Author(s)
Lu, W.-S.
Hwu, J.-G.
JENN-GWO HWU
DOI
10.1109/55.485164
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-0030130022&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/321877
SDGs
[SDGs]SDG6
Type
journal article
