Roughness- Enhanced Reliability of MOS Tunneling Diodes

Resource

IEEE Electron Device Letters 23 (7): 431-433

Journal

IEEE Electron Device Letters

Journal Volume

23

Journal Issue

7

Pages

431-433

Date Issued

2002

Date

2002

Author(s)

Lin, C.-H.

Yuan, F.

Shie, C.-R.

Chen, K.-F.

Hsu, B.-C.

Lee, M.H.

Pai, W.W.

Liu, C.W.

URI

Type

journal article

File(s)

Name

28.pdf

Size

57.39 KB

Format

Adobe PDF

Checksum

(MD5):026bdf764223d4b8fc40980713f70a0f