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College of Science / 理學院
Applied Physics / 應用物理研究所
Structural and electrical characteristics of atomic layer deposited high kappa HfO2 on GaN
Details
Structural and electrical characteristics of atomic layer deposited high kappa HfO2 on GaN
Date Issued
2007
Author(s)
Chang, YC
Chiu, HC
Lee, YJ
Huang, ML
Lee, KY
MINGHWEI HONG
Chiu, YN
Kwo, J
Wang, Yeong-Her
others
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/331415
Type
journal article