In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: Electronic and electric structures

Journal

Nanotechnology

Journal Volume

26

Journal Issue

16

Date Issued

2015

Author(s)

Pi, T.W.

Lin, Y.H.

Fanchiang, Y.T.

Chiang, T.H.

Wei, C.H.

Lin, Y.C.

Wertheim, G.K.

Kwo, J.

DOI

10.1088/0957-4484/26/16/164001

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/443323

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84961289164&doi=10.1088%2f0957-4484%2f26%2f16%2f164001&partnerID=40&md5=aaf24cca9f60a7907a09c0ba1ca5bd0f

Type

journal article