Optical-Gradient Antireflective Coatings for 157-nm Optical Lithography Applications
Resource
Applied Optics 43 (10): 2141-2145
Journal
Applied Optics
Journal Volume
43
Journal Issue
10
Pages
2141-2145
Date Issued
2004
Date
2004
Author(s)
Fan, Wonder
Wang, Tzyy-Jyann
Ko, Fu-Hsiung
Zhai, Run-Sheng
Hsu, Chien-Kui
Chuang, Tung-Jung
Abstract
We demonstrate an optical-gradient bottom antireflective coating (BARC) film, which can be easily prepared by treating a silicon nitride film with oxygen plasma. The oxygen composition is gradually decreased inside the silicon nitride film. The optical constants of the silicon nitride film are also changed gradually. A reflectance of less than 1% for various highly reflective substrates with high thickness-controlled tolerance has been achieved. The optical-gradient film is also shown to have high thermal stability during the postexposure bake procedure. Results indicate that the optical-gradient-type BARC is suitable in both ArF and F2 excimer lasers for sub-70-nm lithography applications. © 2004 Optical Society of America.
Other Subjects
Excimer lasers; Optical coatings; Optical films; Oxygen; Photolithography; Plasmas; Reflection; Silicon nitride; Thermodynamic stability; Thin films; Optical constants; Optical gradient antireflective coatings; Silicon nitride film; Antireflection coatings
Type
journal article
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