Band offsets and charge storage characteristics of atomic layer deposited high- k Hf O2 Ti O2 multilayers

Journal

Applied Physics Letters

Journal Volume

90

Journal Issue

26

Date Issued

2007

Author(s)

Maikap, S.

Wang, T.-Y.

Tzeng, P.-J.

Lin, C.-H.

Tien, T.C.

Lee, L.S.

Yang, J.-R.

Tsai, M.-J.

DOI

10.1063/1.2751579

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/491629

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-34547296613&doi=10.1063%2f1.2751579&partnerID=40&md5=8d65213fcd662eac8223b1550f32d4a2

Type

journal article