Nanopatterning with 248  nm photolithography by photostabilizing bilayer photoresists

Resource

The Journal of Vacuum Science and Technology B 25 (2): 426-429

Journal

The Journal of Vacuum Science and Technology B

Journal Volume

Vacuum

Journal Issue

2

Pages

426-429

Date Issued

2007

Date

2007

Author(s)

Tsai, F.-Y.

Jhuo, S.-J.

Lee, J.-T.

URI

Type

journal article

File(s)

Name

03.pdf

Size

355.29 KB

Format

Adobe PDF

Checksum

(MD5):5cff2f110034506a61b7cdd1ac8f70c9