Etching of ruthenium coatings in O 2- and Cl 2- containing plasmas

Journal

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Journal Volume

24

Journal Issue

1

Pages

1-8

Date Issued

2006

Author(s)

Hsu, C.C.

Coburn, J.W.

Graves, D.B.

JERRY CHENG-CHE HSU

DOI

10.1116/1.2121751

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/445423

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84858519805&doi=10.1116%2f1.2121751&partnerID=40&md5=d9dee273e96959f10dc1d4307cee4d76

Type

journal article