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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Comparison of lateral non-uniformity phenomena between HfO2 and SiO2 from magnified C-V curves in inversion region
Details
Comparison of lateral non-uniformity phenomena between HfO2 and SiO2 from magnified C-V curves in inversion region
Journal
ECS Transactions
Journal Volume
25
Journal Issue
6
Pages
327-338
Date Issued
2009
Author(s)
Cheng, J.Y.
Huang, C.T.
Lu, H.T.
Hwu, J.G.
JENN-GWO HWU
DOI
10.1149/1.3206631
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-76549128163&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/347700
Type
conference paper