Novel bilayer bottom antireflective coating structure for high-performance ArF lithography applications

Journal

Journal of Microlithography, Microfabrication and Microsystems

Journal Volume

1

Journal Issue

1

Pages

58-62

Date Issued

2002

Author(s)

Chen, H.L.

Chao, W.C.

Ko, F.H.

Chu, T.C.

Huang, T.Y.

DOI

10.1117/1.1447947

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/491377

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-0005306540&doi=10.1117%2f1.1447947&partnerID=40&md5=742c26c354d5373a16785dcfedec77ca

Type

journal article