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College of Management / 管理學院
Business Administration / 工商管理學系暨商學研究所
Modeling, Optimization and Control of Wafer-level Spatial Uniformity for Rapid Thermal Oxidation of Silicon Process
Details
Modeling, Optimization and Control of Wafer-level Spatial Uniformity for Rapid Thermal Oxidation of Silicon Process
Journal
Automation Technology Conference
Date Issued
1999-07
Author(s)
RUEY-SHAN GUO
M. Lan
A. Lin
A. Chen
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/352899
Type
conference paper