Large grain poly-Si (?10 μm) TFTs prepared by excimer laser annealing through a thick SiON absorption layer

Journal

IEEE Transactions on Electron Devices

Journal Volume

51

Journal Issue

2

Pages

166-171

Date Issued

2004

Author(s)

Liu, S.-D.

DOI

10.1109/TED.2003.821704

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/498856

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-0442326806&doi=10.1109%2fTED.2003.821704&partnerID=40&md5=df0ab1a8983da4c718ce53d6cab7dddd

Type

journal article