Fabry-Perot type antireflective coatings for binary mask applications in ArF and F2excimer laser lithographies

Journal

Electrochemical and Solid-State Letters

Journal Volume

6

Journal Issue

4

Date Issued

2003

Author(s)

Chen, H.L.

Lee, C.C.

Chuang, Y.F.

Liu, M.C.

Hsieh, C.I.

Ko, F.H.

DOI

10.1149/1.1560001

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/491366

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-0037379672&doi=10.1149%2f1.1560001&partnerID=40&md5=dec3f418863a36005bc986aa7f3fa245

Type

journal article