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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Reactive-Ion Etching of Bismuth Thin Film Using CHF3
Details
Reactive-Ion Etching of Bismuth Thin Film Using CHF3
Journal
International Electron Devices & Materials Symposium IEDMS2018
Date Issued
2018
Author(s)
Yen-Cheng Ko
Ding-Lun Wu
Che-Wei Yang
Hao-Hsiung Lin
HAO-HSIUNG LIN
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/428869
Type
conference paper