Low dielectric constant SILK films as bottom antireflective coating layers for both KrF and ArF lithography

Journal

2001 International Microprocesses and Nanotechnology Conference, MNC 2001

Pages

132-133

Date Issued

2001

Author(s)

Chen, H.L.

Ko, F.H.

Chu, T.C.

Cheng, H.C.

Huang, T.Y.

DOI

10.1109/IMNC.2001.984124

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/491399

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84960373085&doi=10.1109%2fIMNC.2001.984124&partnerID=40&md5=9c0b3222235fd0dcba4e8006cf53da48

Type

conference paper