Enhance Extreme UltraViolet Lithography mask inspection contrast by using Fabry-Perot type antireflective coatings

Journal

Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Pages

94-95

Date Issued

2003

Author(s)

Cheng, H.C.

Chen, H.L.

Ko, T.S.

Lai, L.J.

Ko, F.H.

Chu, T.C.

DOI

URI

URL

Type

conference paper