Reflective EUVL tool design with generalized Gaussian constant mathematics
Journal
Applied Optics
Journal Volume
57
Journal Issue
20
Pages
5884-5892
Date Issued
2018
Author(s)
Hsiao, L.-J.
Abstract
This study aims to develop a systematic design procedure for extreme ultraviolet lithography tools. Through analysis using generalized Gaussian constants, relationships between optical properties and requirements can be obtained, and can be used to help ensure that optical system properties required for the tool are upheld during the design process. As verification of the design method, an eight-mirror 0.4 NA tool design has been demonstrated.
Type
journal article
