Structural Evolution and Electrochemical Performances of Oxygen Plasma-Treated LiMn2O4 Thin-Film Cathodes
Resource
Journal of The Electrochemical Society, 157(3), A289-A293
Journal
Journal of The Electrochemical Society
Journal Volume
157
Journal Issue
3
Pages
-
Date Issued
2010
Date
2010
Author(s)
Chen, Chen Chung
Chiu, Kuo-Feng
Lin, Kun Ming
Yang, Chang-Rung
Wang, Fu Ming
Abstract
Polycrystalline LiMn2 O4 thin films were deposited by radio-frequency (rf) magnetron sputtering followed by annealing at 600°C in air. The films were then treated with an rf-driven oxygen plasma. The crystallization and surface morphology of LiMn2 O4 thin films were correlated with rf powers. The treated samples were tested under harsh conditions such as deep discharge to 1.5 V and cycling at an elevated temperature of 60°C to verify the electrochemical performances of the LiMn2 O4 cathodes. The oxygen plasma treatments significantly improved the electrochemical properties of LiMn2 O 4 thin films. The results showed that the plasma treatments not only resulted in surface densification but also induced finer grains in the subsurface region (10-100 nm), which were believed to enhance the stability of LiMn2 O4 cathodes. © 2010 The Electrochemical Society.
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Type
journal article
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