Data Compression Ratio-aware Detailed Routing for Multiple E-Beam Direct Write Systems
Date Issued
2015
Date
2015
Author(s)
Chiu, Yu-Hsiang
Abstract
The feature size of Integrated Circuits(IC) are shrinking down along with the advancement of technology, but the resolution of the ArF laser is far from the target for next generation lithography. Electron beam (E-beam) lithography, with its high-accuracy characteristic, is very likely to become the main role in next generation lithography. Because of the accuracy of E-beam, the exact information of the circuit has to be delivered to the E-beam emitter. However, circuits nowadays has become so complicated that the successfulness of this process relies on the speed of data transmission, which is not sufficiently fast even with technologies today. So in practice, data should be compressed first, transmitted by optic fibers, and then decompressed in the E-beam machines. In this thesis, we proposed a detailed routing method to improve data compression quality before applying the actual compression algorithm. The results of experiments show that, with one particular data compression algorithm, LineDiff Entropy, chosen, we improve data compression ratio with our proposed detailed router. And we can conclude that considering data compression ratio in physical design phase is a field worth studying.
Subjects
Lithography
Electron Beam
Data Compression Algorithm
Physical Design
Detailed Routing
Type
thesis
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