Enhancement and Management Systems for Overall Equipment Effectiveness of Wafer Fabs
Date Issued
2000
Date
2000
Author(s)
DOI
892212E002039
Abstract
The major categories for equipment effectiveness
loss are speed loss, equipment setup, equipment
idleness, unsatisfactory product quality, unscheduled
downtime, and test wafers. The goal of this project is to
develop methodologies, tools, and a management
system for enhancing overall equipment effectiveness
of wafer fabs. Methods for enhancing equipment
effectiveness in the areas of equipment monitoring,
dynamic preventive maintenance, job dispatching, tool
scheduling, machine assignment, tool portfolio design,
and OEE analysis and management are investigated in
this project. This is the second year of a 2-year research
project. The preliminary results for the first year
include: (subproject I) capacity analysis, capacity
models, resource portfolio planning methods,
(subproject II) analysis and sequencing methods for
cluster tools, and (subproject III) equipment health
indices and prognosis models. The achievements of the
second year are:
Subproject I:
l Optimization of resource portfolio and operating
conditions
l Product mix planning method
l A decision software system
Subproject II:
l Designed, implemented and tested a VLSI chip
for Job Shop Scheduling
l Designed and analyzed (1) statistical-processcontrol-
based schemes for production flow
monitoring, and (2) production rate control
policies for a single-machine, failure prone
system
l Designed and assessed an ordinal optimizationbased
simulation approach for dynamic selection
of scheduling rules
l Developed a method for proportional machine
allocation over a reentrant line
l Demonstrated the feasibility of dynamic
manufacturing service provisioning
Subproject III:
l a dynamic PM scheduling method
Subjects
Overall equipment effectiveness
resource
portfolio planning
portfolio planning
machine assignment
VLSI chip
design
design
equipment monitoring
preventive maintenance
Publisher
臺北市：國立臺灣大學工業工程學研究所
Type
report
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