Fabrication and optical studies of large area gold nanohole array by the combination of nanosphere lithography and reactive ion etching
Date Issued
2006
Date
2006
Author(s)
Chuang, Wei-Jun
DOI
en-US
Abstract
We present here a very simple technique to produce a large area gold nanohole array with the combination of nanosphere lithography and reactive ion etching. A large domain size of gold nanohole arrays up to about 1 cm2 has been successfully fabricated, which represents the largest reported area using the similar techniques. We show that the fabricated Au hole arrays have effective plasma frequencies at infrared region, which confirms the Pendry’s prediction that metallic wire structures can be used to tune the plasma frequency. In addition, we also found that the optical transmission through periodic structures can be enhanced according to the interaction of surface plasmon and the incident light. The novel properties found here for a large-area of periodic array should be important for the application of optoelectronic devices.
Subjects
奈米顆粒球微影術
反應性離子蝕刻技術
金孔洞陣列
nanohole array
nanosphere lithography
reactive ion etching
Type
thesis
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