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  4. Removal of perfluorooctanoic acid and perfluorooctane sulfonate via ozonation under alkaline condition
 
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Removal of perfluorooctanoic acid and perfluorooctane sulfonate via ozonation under alkaline condition

Journal
Journal of Hazardous Materials
Journal Volume
243
Pages
272-277
Date Issued
2012
Author(s)
Lin, A.Y.C.
Panchangam, S.C.
Chang, C.-Y.
Hong, P.K.A.
Hsueh, H.-F.
ANGELA YU-CHEN LIN  
DOI
10.1016/j.jhazmat.2012.10.029
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-84869871130&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/370421
Abstract
The elimination of recalcitrant, ubiquitous perfluoroalkyl acids (PFAAs) such as perfluorooctanoic acid (PFOA) and perfluorooctane sulfonate (PFOS) is desirable for reducing potential human health and environmental risks. We here report the degradation of PFOA and PFOS by 85-100% via ozonation under alkaline condition being studied at environmentally relevant contaminant concentrations of 50μgL-1 to 5mgL-1, with enhanced removal rates by addition of hydrogen peroxide. Enhanced removal is achieved by ozonation pretreatment for 15min at the ambient pH (i.e. 4-5), followed by elevation of pH to 11 and continued ozonation treatment for 4h. The ozonation pretreatment resulted in increased degradation of PFOA by 56% and PFOS by 42%. The results indicated hydroxyl radical-driven degradation of PFOA and PFOS in both treatments by ozone and peroxone under alkaline conditions. Wastewaters from electronics and semiconductor fabrication plants in the Science Park of Hsinchu city, Taiwan containing PFOA and PFOS have been readily treated by ozonation under alkaline condition. Treatment of PFAAs by ozone or peroxone proves to be efficient in terms of energy requirement, contact time, and removal rate. © 2012 Elsevier B.V.
Subjects
Ozonation; Perfluorochemicals; Perfluorooctane sulfonate (PFOS); Perfluorooctanoic acid (PFOA); Peroxone
SDGs

[SDGs]SDG3

[SDGs]SDG6

[SDGs]SDG11

Other Subjects
Alkaline conditions; Contact time; Contaminant concentrations; Energy requirements; Environmental risks; Hsinchu; Human health; Ozonation treatment; Perfluoroalkyl acids; Perfluorochemicals; Perfluorooctane sulfonates; Perfluorooctanoic acid; Peroxone; Pre-Treatment; Removal rate; Science park; Semiconductor fabrication plant; Alkalinity; Health risks; Hydrogen peroxide; Ozone water treatment; Ozonization; Wastewater treatment; Ozone; hydrogen peroxide; hydroxyl radical; ozone; perfluorooctanesulfonic acid; perfluorooctanoic acid; alkalinity; carboxylic acid; concentration (composition); environmental risk; hydroxyl radical; inosilicate; ozone; pH; pollutant removal; public health; sewage treatment; sulfonate; alkalinity; article; degradation; effluent; energy; ozonation; pH; reaction time; semiconductor; Taiwan; waste component removal; waste water management; Alkalies; Alkanesulfonic Acids; Caprylates; Catalysis; Chromatography, High Pressure Liquid; Fluorocarbons; Free Radical Scavengers; Hydrogen Peroxide; Hydrogen-Ion Concentration; Ozone; Photochemistry; Solid Phase Extraction; Tandem Mass Spectrometry; Waste Disposal, Fluid; Water Pollutants, Chemical; Hsinchu; Taiwan
Type
journal article

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