In Situ Monitoring of Silicon Membrane Thickness during Wet Etching using a Surface Acoustic Wave Sensor

Resource

Japanese Journal of Applied Physics 43 (6A): 3611-3617

Journal

Japanese Journal of Applied Physics

Journal Issue

43

Pages

3611-3617

Date Issued

2004

Date

2004

Author(s)

Lee, Chi-Yuan

Cheng, Ying-Chou

Chen, Yung-Yu

Chen, Ping-Hei

Chen, Wen-Jong

DOI

URI

File(s)

Name

11.pdf

Size

283.75 KB

Format

Adobe PDF

Checksum

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