Characteristic Simulation and Fabrication Technique of hotonic Crystal Structure
Date Issued
2006
Date
2006
Author(s)
Chen, Pei-Yuan
DOI
zh-TW
Abstract
Abstract
Since 1980s, Photonic Crystal rapidly becomes very popular for
optoelectronics and is widely studied as photonic materials. In this thesis, we will describe the principle of photonic crystals, their manufacture technology, their wave-guiding and electromagnetic function, and their applications.
The main characteristic of electromagnetic wave in Photonic Crystal is the periodic structure of different dielectric constant. The width of regular period is from visible light to infrared.(80~800nm). The research in Photonic Crystal fabrication could be separated into two different fabrication techniques:
(1) Nanolithography
(2) Self-Assembly
This thesis research fabrications above: (1) Spinning upon photoresist on Si wafer and defining 200nm line width by deep UV aligner. We get periodic hole in Si wafer using RIE technique. (2) Synthesizing SiO2 particles with C2H5OH, NH4OH, TEOS, DI water. The diameter of particles is about 100nm to 200nm. Use the SiO2 particles to fabricate Self-Assembly Photonic Crystal. We look forward to this structure to improve various light sources.
Subjects
光子晶體
Photonic Crystal
Type
thesis
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