Mu synthesis Control of Scanning Probe Microscope for Nanolithography
Date Issued
2004
Date
2004
Author(s)
Chang, Ching-Hsiang
DOI
zh-TW
Abstract
This thesis addresses the 2-dimensional scanning probe microscope (SPM) lithography by scratching the sampling surface. The previous research has shown that servo controller has significant effect on the lithography. Carefully designed controller achieves more uniform scratch marks. This research has demonstrated that many unexpected effect can be observed when marking multiple lines. The material on the sample surface piles up on the sides of the plow mark. The plow mark would then become uneven when one tries to widen the ditch. The study also shows that it is possible to achieve more even marking geometry by carefully operate the cutting procedure. A Mu-synthesis controller is also presented to show how the outcome performance can be incorporated at the design stage. The experimental results confirm the design specifications.
Subjects
定力控制
掃描探針微影術
Mu合成控制
奈米微影
原子力顯微鏡
SPM lithography
Nanolithography
Mu synthesis
AFM
force control
Type
thesis