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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Sub-micron gate by optical lithography using photoresist re-flow and spin-on-glass
Details
Sub-micron gate by optical lithography using photoresist re-flow and spin-on-glass
Journal
ECS, State-of-the-art Program on Compound Semiconductors XXXV
Pages
154-157
Date Issued
2001-01
Author(s)
W.-S. Lour
M.-K. Tsai
K.-C. Chen
Y.-W. Wu
S.-W. Tan
YING-JAY YANG
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/294650
Type
conference paper