Effect of Dilution Gas on SiCN Films Growth Using Methylamine

Journal

Materials Chemistry and Physics

Journal Volume

72

Journal Issue

2

Pages

240-244

Date Issued

2001

Author(s)

J.-J. Wu

K. H. Chen

C. Y. Wen

Y. C. Yu

C. W. Wang

E. K. Lin

DOI

https://doi.org/10.1016/S0254-0584(01)00445-X

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/503913

Publisher

Elsevier B.V.

Type

journal article