Fast lithographic mask optimization considering process variation

Journal

IEEE/ACM International Conference on Computer-Aided Design

Journal Volume

2015-January

Journal Issue

January

Pages

230-237

Date Issued

2015

Author(s)

Su, Y.-H.

Huang, Y.-C.

Tsai, L.-C.

Chang, Y.-W.

Banerjee, S.

DOI

10.1109/ICCAD.2014.7001357

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-84936869631&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/393139

Type

conference paper