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College of Engineering / 工學院
Materials Science and Engineering / 材料科學與工程學系
Nucleation engineering for atomic layer deposition of uniform sub-10 nm high-K dielectrics on MoTe2
Details
Nucleation engineering for atomic layer deposition of uniform sub-10 nm high-K dielectrics on MoTe2
Journal
Applied Surface Science
Journal Volume
492
Pages
239-244
Date Issued
2019
Author(s)
Lin, Y.-S.
Kwak, I.
Chung, T.-F.
Yang, J.-R.
Kummel, A.C.
MIIN-JANG CHEN
DOI
10.1016/j.apsusc.2019.06.192
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/491490
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-85067891764&doi=10.1016%2fj.apsusc.2019.06.192&partnerID=40&md5=79c1f229ff916efd8921a72e17e6bb82
SDGs
[SDGs]SDG6
Type
journal article