Simulation on Radiation Characteristics of an Electric Dipole near a Metallic Nanograting
Date Issued
2010
Date
2010
Author(s)
Yu, Zan-Yao
Abstract
The combination of the array scanning method (ASM) and the finite element method (FEM) is utilized to simulate a one-dimensional (1-D) reflection-type Ag or Ag-SiO2 grating structure contacting a GaN half space embedded with a three-dimensional dipole source. We find that the radiation characteristics of the system depend on the orientation and the location of the dipole. We first investigate the effect for different orientations of the dipole: in the grating-varied-, groove-, or 45-degree-direction. Then we examine the individual and average effects of the dipole located at the positions uniformly distributed between the protruding and groove parts of the grating. Our numerical results manifest that this kind of 1-D gratings may not be suitable for enhancing the polarization ratio if a light source is a layer-type structure, like a GaN quantum well. However, if a light source has some kind of localization, like a semiconductor nanowire, a quantum wire, or a quantum dot, and is located beneath the protruding part of the grating, this structure still has a chance to enhance the polarization ratio. Besides, the total radiation power for a Ag-SiO2 grating system is higher than that for a Ag grating system.
Subjects
surface plasmon
metal grating
light emission
light emission diodie
polarization ratio
radiation characteristics
Type
thesis
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