Focused-Ion-Beam-Based Selective Closing and Opening of Anodic Alumina Nanochannels for the Growth of Nanowire Arrays Comprising Multiple Elements
Resource
Advanced Materials 20 (13): 2547-2551
Journal
Advanced Materials
Journal Volume
20
Journal Issue
13
Pages
2547-2551
Date Issued
2008
Date
2008
Author(s)
Abstract
The development of a complete resist-free lithographic process for the selective closing and reopening of anodic aluminum oxide (AAO) nanochannels, using focused ion beam (FIB) direct writing, was reported. The image analysis results indicate that the average pore diameter of an ordered array gradually decreases with increasing ion dose, whereas standard deviation of the pore diameter increases with increasing ion dose. The reduction in pore diameter is found to be strongly dependent on the energy of the FIB, while the changes in the surface morphology is due to large size variations of the pores. The results also show that the materials within the simulated range are relocated by ion bombardment to maintain the equilibrium thickness of the capping layer. The growth of Ag nanowires takes place within the open nanochannels, and no deposition of Ag is found to occur in the closed nanochannels.
Other Subjects
Alumina; Electric wire; Focused ion beams; Image analysis; Ion beams; Ions; Nanostructured materials; Nanostructures; Nanowires; Water pollution; Ag nanowires; Analysis results; Anodic aluminas; Anodic aluminum oxides; Capping layers; Direct writings; Ion doses; Large sizes; Lithographic processes; Multiple elements; Nanochannels; Nanowire arrays; Ordered arrays; Pore diameters; Standard deviations; Ion bombardment
Type
journal article
File(s)![Thumbnail Image]()
Loading...
Name
114.pdf
Size
285.03 KB
Format
Adobe PDF
Checksum
(MD5):b50f13ff348928171465de56ff7ebf18