Correlation of the growth rate for selective epitaxial growth of silicon and oxide thickness and oxide coverage in a reduced pressure chemical vapor deposition pancake reactor

Journal

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Journal Volume

26

Journal Issue

5

Pages

1712-1717

Date Issued

2008

Author(s)

Lee, K.-Y.

DOI

URI

Type

journal article