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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Metal gate/High-K dielectric stack on Si cap/ultra-thin pure Ge epi/Si substrate
Details
Metal gate/High-K dielectric stack on Si cap/ultra-thin pure Ge epi/Si substrate
Journal
2005 IEEE Conference on Electron Devices and Solid-State Circuits, EDSSC
Pages
107-110
Date Issued
2006
Author(s)
Yeo, C.C.
Lee, M.H.
Liu, C.W.
Choi, K.J.
Lee, T.W.
Cho, B.J.
CHEE-WEE LIU
DOI
10.1109/EDSSC.2005.1635217
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/502109
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-43549119975&doi=10.1109%2fEDSSC.2005.1635217&partnerID=40&md5=e8c98e84cb5f397f9f2bca0f2112bbad
Type
conference paper