Thermal stability of Si/Si1-x-yGexCy/Si quantum wells grown by rapid thermal chemical vapor deposition

Journal

Journal of Applied Physics

Journal Volume

85

Journal Issue

4

Pages

2124-2128

Date Issued

1999

Author(s)

Liu, C.W.

Tseng, Y.D.

Chern, M.Y.

Chang, C.L.

DOI

10.1063/1.369513

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0001458853&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/347689

Type

journal article