Thermal diffusivity in amorphous silicon carbon nitride thin films by the traveling wave technique
Journal
Applied Physics Letters
Journal Volume
79
Journal Issue
3
Pages
332-334
Date Issued
2001
Author(s)
Abstract
Thermal diffusivity of thin films of amorphous silicon carbon nitride, prepared by ion beam sputtering was studied by traveling wave technique. The change of thermal diffusivity with carbon content was reported in amorphous silicon carbon nitride samples. There was a decrease in diffusivity values for higher carbon concentrations. A similar variation was observed for the density of the films as a function of carbon content.
Type
journal article