Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography

Resource

Journal of Vacuum Science & Technology B 19 (6): 2357-2361

Journal

Journal of

Journal Volume

Vacuum

Journal Issue

6

Pages

2357-2361

Date Issued

2001

Date

2001

Author(s)

Lin, C. H.

Wang, L. A.

URI

http://ntur.lib.ntu.edu.tw//handle/246246/148183

Type

journal article

File(s)

Name

38.pdf

Size

124.32 KB

Format

Adobe PDF

Checksum

(MD5):6b9fec8962af0c5b8ca9911db0d42bf1