Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resists

Journal

Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Pages

224-225

Date Issued

2003

Author(s)

Kuo, C.I.

Chen, H.L.

Chu, Y.H.

Liu, F.K.

Ko, F.H.

Chu, T.C.

DOI

URI

URL

Type

conference paper