Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography
Journal
Proceedings of SPIE - The International Society for Optical Engineering
Journal Volume
7520
Date Issued
2009
Author(s)
CHIEH-HSIUNG KUAN
Chen, S.-Y.
Tsai, K.-Y.
Ng, H.-T.
Fan, C.-H.
Pei, T.-H.
Kuan, C.-H.
Chen, Y.-Y.
Yen, J.-Y.
CHIEH-HSIUNG KUAN
Type
conference paper