Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography
Journal
Proceedings of SPIE - The International Society for Optical Engineering
Journal Volume
7520
Date Issued
2009
Author(s)
CHIEH-HSIUNG KUAN
Chen, S.-Y.
Tsai, K.-Y.
Ng, H.-T.
Fan, C.-H.
Pei, T.-H.
Kuan, C.-H.
Chen, Y.-Y.
Yen, J.-Y.
CHIEH-HSIUNG KUAN
Abstract
Multiple-electron-beam-direct-write lithography is one of the promising candidates for next-generation lithography because of its high resolution and ability of maskless operation. In order to achieve the throughput requirement for highvolume manufacturing, miniaturized electro-optics elements are utilized in order to drive massively parallel beams simultaneously. Electron beam drift problems can become quite serious in multiple-beam systems. Periodic recalibration with reference markers on the wafer has been utilized in single-beam systems to achieve beam placement accuracy. This technique becomes impractical with multiple beams. In this work, architecture of a two dimensional beam position monitor system for multiple-electron-beam lithography is proposed. It consists of an array of miniaturized electron detectors placed above the wafer to detect backscattered electrons. The relation between beam drift and distribution of backscattered-electron trajectories is simulated by an in-house Monte Carlo electron-scattering simulator. Simulation results indicate that electron beam drift may be effectively estimated from output signals of detector array with some array signal processing to account for cross-coupling effects between beams.
Type
conference paper