Enhancement of Critical-Current Density in Direct-Current-Sputtered Tlba2ca2cu3o9-/+delta Superconducting Thin-Films
Journal
Applied Physics Letters
Journal Volume
66
Journal Issue
7
Pages
885-887
Date Issued
1995
Author(s)
Abstract
A multistep postannealing scheme has been developed for preparing nearly single phased, c-axis oriented TlBa2Ca2Cu3Ox (Tl-1223) superconducting thin films fabricated by the direct-current-sputtering process. Films obtained by the present process have shown, for the first time in this system, a critical current density (Jc) above 106 A/cm2 at 77 K with a zero-resistance transition temperature Tc0≊110 K. The order of magnitude enhancement in Jc is attributed to the improvement of film morphology which, in turn, removed most of the weak links encountered previously.
Type
journal article