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  4. Self-assembled monolayers of 2-(thienyl)hexylphosphonic acid on native oxide surface of silicon fabricated by air-liquid interface-assisted method
 
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Self-assembled monolayers of 2-(thienyl)hexylphosphonic acid on native oxide surface of silicon fabricated by air-liquid interface-assisted method

Journal
Journal of Colloid and Interface Science
Journal Volume
324
Journal Issue
1-2
Pages
236-239
Date Issued
2008
Author(s)
Hsu, Chih-Wei
Liou, Huei-Ru
WEI-FANG SU  
LEE-YIH WANG  
DOI
10.1016/j.jcis.2008.04.037
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-49949151853&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/344236
http://ntur.lib.ntu.edu.tw/bitstream/246246/93667/1/62.pdf
Abstract
A simple, fast, and low-compound-consuming procedure based on the air-liquid interface-assisted method for preparing self-assembled monolayers (SAMs) of organic molecules with phosphonic acid head groups on the native oxide surface of silicon was demonstrated. The SAMs thus prepared were characterized by contact angle measurement, X-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR), and atomic force microscopy (AFM). This approach enabled the fabrication of ordered SAMs in a large-area substrate. © 2008 Elsevier Inc. All rights reserved.
Subjects
Phosphonic acid; Self-assembled monolayer; Silicon oxide
Type
journal article
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