Design and fabrication of plasmonics device and its application to photolithography
Date Issued
2009
Date
2009
Author(s)
Chang, Chin-Kai
Abstract
Due to the limitation of optical diffraction, it constrained the ability of fabricating line width in semiconductor process. In addition to reduce the wavelength and immersion lithography, we also could increase the lens of numerical aperture to enhance the optical resolution. However, they are very expensive for above mentioning methods, and the development of semiconductor was constrained recently. ecently, the theory and experiment of nano-optics has developed well. This thesis uses the principle of surface plasmon to design and fabricate the plasmonics device. We propose the some metallic nanostructure included double sided metallic nanostructure, multi-ring metallic nanostructure and ring containing circular groove metallic nanostructure, and use the focused ion beam to fabricate these nanostructures. In optical experiment, we use the confocal microscopy to measure the characteristics of nanostructure. We found the structure on the silver film have unique optical properties, which have high optical transmission, long depth of focus and subwavelength focal spot for specific incident wavelength. These properties could make the plasmonics lens to become a tool of optical lithography. n application, we use the multi-ring metallic nanostructure to integrate on the laser writer and microlens. With integrating on the laser writer, we could use this system to make a sub-micron pattern in the atmosphere. Besides, we could obtain a novel focusing lens as integrating with microlens. Finally, we use the single metallic ring structure to fabricate the high aspect ratio structure at negative photoresist directly. It could prove our metallic lens to possess good optical properties.
Subjects
Nano Optics
Surface Plasmon
Subwavelength Structure
Optical Lithography
Type
thesis
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