A study of nano-laminatd gas barrier films by using atomic layer deposition
Date Issued
2010
Date
2010
Author(s)
Ming-Hom, Zheng
Abstract
This study developed nano-laminated gas-permeation barriers with atomic layer deposition (ALD) to achieve low gas permeability, high flexibility/bendability, and in-air stability. Two material systems were investigated: Al2O3/HfO2 (AHO) and Al2O3/ZnO (AZO), the latter of which was a novel material for gas barrier applications. The barrier performance and flexibility of the nano-laminates were significantly dependent upon the Al2O3/HfO2 (A/H) and Al2O3/ZnO (A/Z) ratios: they both deteriorated with increasing A/H and A/Z ratios. This was attributed to the crystalline nature of HfO2 and ZnO, which increased the susceptibility to bending of the nano-laminates and provided grain boundaries for rapid gas permeation. Comparing AZO and AHO with the same A/Z and A/H ratios, we found that AZO was generally poorer gas barriers than AHO, likely as a result of ZnO’s greater tendency to crystallize; however, at lower ratios, AZO had lower gas permeability than AHO, likely as a result of better surface coverage enabled by the lower steric hindrance of the ZnO organometallic precursor. Upon optimizations of the composition and ALD conditions, both the AZO and AHO films achieved low water vapor transmission rate (WVTR) and oxygen transmission rate (OTR) (WVTR < 5×10-4 g /m2/day; OTR < 2×10-2 c.c./m2/day) and remained stable upon storage in air for > 1500 h or bending for 2000 times.
Subjects
ALD
gas barrier film
gas permeability
Type
thesis
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