Publication:
Non-uniform hole current induced negative capacitance phenomenon examined by photo-illumination in MOS(n)

cris.lastimport.scopus2025-05-15T22:03:02Z
cris.virtual.departmentElectrical Engineeringen_US
cris.virtual.departmentElectronics Engineeringen_US
cris.virtual.orcid0000-0001-9688-0812en_US
cris.virtualsource.departmentd18091e7-be53-4dda-8b3d-eb34dffdaaa8
cris.virtualsource.departmentd18091e7-be53-4dda-8b3d-eb34dffdaaa8
cris.virtualsource.orcidd18091e7-be53-4dda-8b3d-eb34dffdaaa8
dc.contributor.authorJENN-GWO HWUen
dc.creatorLin, H.H. and Lin, Y.K. and Hwu, J.G.
dc.date.accessioned2018-09-10T15:19:45Z
dc.date.available2018-09-10T15:19:45Z
dc.date.issued2015
dc.description.abstractThe photo-induced negative capacitance (NC) phenomenon in MOS(n) is firstly observed and investigated by both experiments and simulations. The possible mechanism for NC phenomenon is proposed. It is shown that NC is resulted from non-uniform hole-electron recombination process due to lateral diffusion of photo-induced holes. The insufficiency of bulk holes for hole-electron recombination leads to voltage-current lag and NC behavior. © The Electrochemical Society.
dc.identifier.doi10.1149/06905.0261ecst
dc.identifier.scopus2-s2.0-84946089301
dc.identifier.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-84946089301&doi=10.1149%2f06905.0261ecst&partnerID=40&md5=30637a0cbf4f1ef4987f4566f1bb1d8d
dc.identifier.urihttp://scholars.lib.ntu.edu.tw/handle/123456789/391183
dc.languageenen
dc.relation.ispartofECS Transactionsen_US
dc.relation.journalissue5
dc.relation.journalvolume69
dc.relation.pages261-265
dc.sourceAH
dc.subject.otherNanoelectronics; Hole current; Hole-electron recombination; Lateral diffusion; Negative capacitance; Non-uniform; Photo-induced; Possible mechanisms; Voltage current; Capacitance
dc.titleNon-uniform hole current induced negative capacitance phenomenon examined by photo-illumination in MOS(n)
dc.typeconference paper
dspace.entity.typePublication

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