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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Reactive Ion Etching of GaAs Using CCl2F2 Plasma
Details
Reactive Ion Etching of GaAs Using CCl2F2 Plasma
Resource
17th EDMS, p.272-275
Journal
17th EDMS
Pages
272-275
Date Issued
1991
Date
1991
Author(s)
Lin, Hao-Hsiung
URI
http://ntur.lib.ntu.edu.tw//handle/246246/121551
Type
conference paper
