Use of SiO 2 nanoparticles As etch mask to generate Large-area GaAs nanowires by Induced-Coupled Plasma Reactive Ion Etcher

Journal

CLEO/Europe - EQEC 2009 - European Conference on Lasers and Electro-Optics and the European Quantum Electronics Conference

Date Issued

2009

Author(s)

Wang, D.-S.

Chao, J.-J.

DOI

URI

Type

conference paper