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College of Engineering / 工學院
Applied Mechanics / 應用力學研究所
Novel Method for In-Situ Monitoring of Thickness of Silicon Wafer during Wet Etching
Details
Novel Method for In-Situ Monitoring of Thickness of Silicon Wafer during Wet Etching
Resource
Sensors and Materials 18 (2): 71-82
Journal
Sensors and Materials
Journal Volume
18
Journal Issue
2
Pages
71-82
Date Issued
2006-05
Date
2006-05
Author(s)
Lee, Chi-Yuan
Chang, Pei-Zen
Chen, Yung-Yu
Dai, Ching-Liang
Wang, Xuan-Yu
Chen, Ping-Hei
Lee, Shuo-Jen
URI
http://ntur.lib.ntu.edu.tw//handle/246246/106996