The development of a quality-based job dispatching index for the IC ion implantation process
Date Issued
2011
Date
2011
Author(s)
Paola Alfaro Silva, Andrea
Abstract
The ion implantation process in the IC fabrication is one of the most important steps that determine the wafer quality. During the process, the filament in the equipment is heated, and the resistance of the filament decreases or increases depending on the recipes processed. Equipment with too large or too small resistance of the filament may produce unacceptable quality wafers. Therefore, not like the dispatching scheme for the other IC fabrication processes, the scheme for an ion implantation process must consider not only the minimum total process time and due dates but also the machine operational quality condition.
This research proposes a quality-based job dispatching index for the IC ion implantation process that minimizes the total process time and meets due dates, as well as improves the equipment operational quality condition. In an on-line look-ahead base, the quality-based job dispatching index for all work in process jobs are estimated, and the jobs with the largest index is picked to be processed next. For the comparison purpose, besides the proposed quality index, two more job dispatching indexes with a recipe mix priority and a joint priority are established, respectively, in this study. A single machine simulation model is established, and used to evaluate the three indexes under two specific scenarios. The simulation results provide insights about the implementation of the quality-based index, and demonstrate the quality-based index can achieve the goals better than the other two indexes.
Subjects
IC fabrication
ion implantation process
job dispatching
quality
simulation model
Type
thesis
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