High Performance Nano-Manipulation Stage for a E-Beam Lithography System
Date Issued
2007
Date
2007
Author(s)
Shiao, Chih-Kai
DOI
zh-TW
Abstract
In this thesis we design a precision 6 degree-of-freedom motion stage for the scanning electron microscope (SEM) system. The SEM system shines high power electron beam on the sample surface, and measures the sample structure by measuring the amount of back scattered secondary electrons from the sample surface. The usual SEM has electron optics to focus and scan the beam across the sample. The resolution of the scan and the available tilting angle are limited. It is thus desirable to have a high resolution multi-d-o-f stage within the SEM chamber. This thesis proposes the design of a novel 6 d-o-f precision piezoelectric stage. To simplify the control, we checked the interference to ensure that each degree-of-freedom motion does not interfere with other axes. We then design a high performance servo controller for the stage. To match the motion range requirements, the stage have motion range of 20
Subjects
奈米平台
多自由度
壓電致動器
順滑模態控制
遲滯效應
nano stage
multi-d-o-f
piezoelectric
sliding mode control
hysteresis
Type
thesis
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