Microlithography Imaging Simulation with Coherent and Partially Coherent Light Sources
Date Issued
2006
Date
2006
Author(s)
Chung, Shih-Yung
DOI
en-US
Abstract
At the present days, the key and critical part of industrial IC manufacture is
the optical lithography technology which can duplicate the design patterns at
the mask onto wafer by light exposure.The most direct and accurate simulation is the imaging of
patterns on wafer. Accurate imaging simulation can show exposed and unexposed
regions after photolithography by computer. We propose an analytical solution for Hopkins
formula that we don't need to transfer the mask patterns into
frequency domain or convolve them with the kernels. Actually, we can directly
compute the image intensity of each single pixel by using integration of power
series or polynomials of the kernals.
Subjects
微影成像
部份同調光源
microlithography simulation
partially coherent
Type
thesis
File(s)![Thumbnail Image]()
Loading...
Name
ntu-95-R93943071-1.pdf
Size
23.31 KB
Format
Adobe PDF
Checksum
(MD5):3710d63a3e08189c33c7d08c90c42c42