Study of Nanoimprint Fabrication Method for Nanowriter Optical Head
Date Issued
2004
Date
2004
Author(s)
Wang, Yeong-Feng
DOI
zh-TW
Abstract
The objective of this thesis is on the fabrication of optical heads for nanowriters using nanoimprint lithography. Nanowriters focus light by sub-wavelength periodic structures, in which extraordinary optical transmission and directional beaming phenomena occur. The phenomena exhibit high energy transmission and small divergence angle so that nanometer light beams can be induced without using optical lens. Consequently nanowriters can provide better exposure resolution than conventional laser writers. Because the cost for optical heads is high with conventional fabrication methods, nanoimprint lithography, a high-throughput, low-cost method, is chosen to make nanowriter optical heads. Let is hoped that such a fabrication process can provider an economical alternative for mass production of optical head.
The quality of a mold greatly affects the results of nanoimprint lithography. This work uses e-beam writer to define nano-patterns and then manipulates ICP to transfer structures to 3-inch silicon wafers. Finally hot embossing machine is utilized to imprint nano-pattern arrays on 3-inch wafer. The related details are discussed in this work. The discussions include: some conception of e-beam lithography patterning design and parameters of exposure and develop, the problems during ICP etching, adjusting imprint status by material properties and hot embossing equipment.
Subjects
奈米壓印微影
奈米直寫儀
nanoimprint lithography
nanowriter
Type
thesis
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